A bright future

Welcome to Echerkon Technologies Ltd. We provide equipment, processes and consultancy to the Photovoltaic industry.

Our Nitor 301 system is a flexible R&D deposition tool which uses Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD). The wide substrate temperature range of 350 °C to 700 °C enables deposition of amorphous, microcrystalline and crystalline silicon films on materials such as glass, ceramics or silicon.

We also have experience and contacts throughout the photovoltaic and semiconductor industries. We are specialists in the layout, planning and realisation of technological solutions for high vacuum systems and exhaust-stream treatment from CVD process facilities. We will be pleased to assist you with your enquiries.

Meet us in Valencia at the PV Experts Booth L2/H3/A47